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Text Registration
Copyright Title
Chemical vapor deposition edited by Jong-Hee Park, T. S. Sudarshan
Status
Published
on 14 Jun 2007
Year of Creation
2001
Copyright Claimant
ASM International
Registration Number
TX0005515491
on 14 Jun 2007Copyright Summary
The U.S. Copyright record (Registration Number: TX0005515491) dated 14 Jun 2007, pertains to an electronic file (eService) titled "Chemical vapor deposition edited by Jong-Hee Park, T. S. Sudarshan" created in 2001. The copyright holder is ASM International, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to ASM International.
Application Details
Registration Number
TX0005515491
Registration Date
6/14/2007
Year of Creation
2001
Place of First Publication
Materials Park, OH
Publisher Name
ASM International
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
481 p
Series Statement
Surface engineering series vol. 2
Notes
Local Copyright Note: C.O. correspondence
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