Computer File Registration
Copyright Title
1D vs 2D patterning limits in advanced lithography
Status
Unpublished
on 29 Aug 2021
Year of Creation
2021
Copyright Claimant
Frederick Chen
Registration Number
PAu004101440
on 29 Aug 2021Copyright Summary
This copyright record (Registration Number: PAu004101440) was filed with the U.S. Copyright Office on 29 Aug 2021. The work is titled "1D vs 2D patterning limits in advanced lithography" and was created in 2021. Frederick Chen holds the copyright for this computer file registration work. Direct all inquiries regarding this material to the copyright holder.
Application Details
Registration Number
PAu004101440
Registration Date
8/29/2021
Year of Creation
2021
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
Electronic file (eService)
Notes
Rights Note: Frederick Chen, 507 Kaiyuan Rd., 23-6, North Dist. Tainan City, 70442, Taiwan, (886) 987-0582 x19, chen.t.fred@gmail.com
Statements
Application Title Statement: 1D vs 2D patterning limits in advanced lithography
Author Statement: Frederick Chen 1968 Domicile: Taiwan Citizenship: United States Authorship: PowerPoint Presentation
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