2007

Electron beam induced conductivity effect of polymer resists and charging induced electron beam deflection simulation in electron beam lithography

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Electron beam induced conductivity effect of polymer resists and charging induced electron beam deflection simulation in electron beam lithography

Status

Published

on 14 Jun 2007

Year of Creation

2000

Justin Jia-jen Hwu

Registration Number

TX0005244404

on 14 Jun 2007

The U.S. Copyright record (Registration Number: TX0005244404) dated 14 Jun 2007, pertains to an electronic file (eService) titled "Electron beam induced conductivity effect of polymer resists and charging induced electron beam deflection simulation in electron beam lithography" created in 2000. The copyright holder is Justin Jia-jen Hwu, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Justin Jia-jen Hwu.

Justin Jia-jen Hwu

Application Details

Registration Number

TX0005244404

Registration Date

6/14/2007

Year of Creation

2000

Agency Marc Code

DLC-CO

Record Status

New

Physical Description

Computer text data

Personal Authors

Justin Jia-jen Hwu

Notes

Rights Note: Rights and permissions info. on CORDS appl. in CO

Bibliographic Note: Electronic registration

Statements

Author Statement: entire text: Justin Jia-jen Hwu

Notes

Rights Note: Rights and permissions info. on CORDS appl. in CO

Bibliographic Note: Electronic registration

Statements

Author Statement: entire text: Justin Jia-jen Hwu

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