2012

Titanium nitride/hafnium dioxide/silicon dioxide/silicon gate stacks reliability: Contribution of hafnium dioxide and interfacial silicon dioxide layer

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Titanium nitride/hafnium dioxide/silicon dioxide/silicon gate stacks reliability: Contribution of hafnium dioxide and interfacial silicon dioxide layer

Status

Published

on 22 Feb 2012

Year of Creation

2011

Nilufa Rahim

Registration Number

TX0006738074

on 22 Feb 2012

The U.S. Copyright record (Registration Number: TX0006738074) dated 22 Feb 2012, pertains to an electronic file (eService) titled "Titanium nitride/hafnium dioxide/silicon dioxide/silicon gate stacks reliability: Contribution of hafnium dioxide and interfacial silicon dioxide layer" created in 2011. The copyright holder is Nilufa Rahim, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Nilufa Rahim.

Nilufa Rahim

Application Details

Registration Number

TX0006738074

Registration Date

2/22/2012

Year of Creation

2011

Agency Marc Code

DLC-CO

Record Status

New

Physical Description

Computer text data

Personal Authors

Nilufa Rahim

Notes

Rights Note: Rights and permissions info. on CORDS appl. in CO

Local Copyright Note: Electronic registration

Statements

Author Statement: entire text: Nilufa Rahim

Notes

Rights Note: Rights and permissions info. on CORDS appl. in CO

Local Copyright Note: Electronic registration

Statements

Author Statement: entire text: Nilufa Rahim

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