Text Registration
Copyright Title
Effects of chamber wall conditions on plasma etching processes
Status
Published
on 14 Jun 2007
Year of Creation
2002
Copyright Claimant
Saurabh Jayesh Ullal
Registration Number
TX0005602301
on 14 Jun 2007Copyright Summary
The U.S. Copyright record (Registration Number: TX0005602301) dated 14 Jun 2007, pertains to an electronic file (eService) titled "Effects of chamber wall conditions on plasma etching processes" created in 2002. The copyright holder is Saurabh Jayesh Ullal, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Saurabh Jayesh Ullal.
Application Details
Registration Number
TX0005602301
Registration Date
6/14/2007
Year of Creation
2002
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
Computer text data
Notes
Rights Note: Rights and permissions info. on CORDS appl. in CO
Bibliographic Note: Electronic registration
Statements
Author Statement: entire text: Saurabh Jayesh Ullal
© 2023 reserved by Trademarkia
Show terms & conditions
Disclaimer: The information contained in this website is provided for informational purposes only, and should not be construed as legal advice. Although LegalForce RAPC Worldwide P.C., dba Trademarkia P.C., is a law firm (the “Firm”), your use of this website does not establish an attorney-client relationship with the Firm. Such a relationship can only be established after the Firm decides that it is willing and able to accept the engagement after a conflict check and after a written retainer agreement is agreed upon between you and the Firm. Your use of this website is also subject to our Terms of Use and Privacy Policy. ** The entry level subscription is a bundled price which requires a minimum of two billing cycles, or 6 months.