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Chemical Mechanical Polishing of Silicon Dioxide, Silicon Nitride and Polysilicon Using Ceria Slurries
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Copyright Title

Chemical Mechanical Polishing of Silicon Dioxide, Silicon Nitride and Polysilicon Using Ceria Slurries

Status

Published

on 14 Mar 2019
Year of Creation
2018
Copyright Claimant
Sheik Ansar Usman Ibrahim
Registration Number
TX0008692515
on 14 Mar 2019

Copyright Summary


The U.S. Copyright record (Registration Number: TX0008692515) dated 14 Mar 2019, pertains to an electronic file (eService) titled "Chemical Mechanical Polishing of Silicon Dioxide, Silicon Nitride and Polysilicon Using Ceria Slurries" created in 2018. The copyright holder is Sheik Ansar Usman Ibrahim, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Sheik Ansar Usman Ibrahim.

Copyright Details


Copyright Claimant
Sheik Ansar Usman Ibrahim

Application Details


Registration Number
TX0008692515
Registration Date
3/14/2019
Year of Creation
2018
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
Electronic file (eService)
First Publication Nation
United States

Notes


Rights Note: Mark Dill, ProQuest-CSA, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600, disspub@proquest.com

Statements


Application Title Statement: Chemical Mechanical Polishing of Silicon Dioxide, Silicon Nitride and Polysilicon Using Ceria Slurries
Author Statement: Sheik Ansar Usman Ibrahim Citizenship: not known Authorship: text
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