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Shenzhen Siwuwei Technology Co._AIWOGEP Mask [Group registration of published photographs 11 photographs 2019-06-17 to 2019-09-11]
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Visual Material Registration
Copyright Title

Shenzhen Siwuwei Technology Co. AIWOGEP Mask [Group registration of published photographs 11 photographs 2019-06-17 to 2019-09-11]

Status

Published

on 17 Sept 2019
Registration Number
VA0002174441
on 17 Sept 2019

Copyright Summary


The U.S. Copyright record (Registration Number: VA0002174441) dated 17 Sept 2019, pertains to an electronic file (eService) titled "Shenzhen Siwuwei Technology Co._AIWOGEP Mask [Group registration of published photographs 11 photographs 2019-06-17 to 2019-09-11]" created in 0. The copyright holder is Shenzhen Siwuwei Technology Co., Ltd, known for their creative contributions in visual material registration. For any inquiries concerning this copyrighted material, kindly reach out to Shenzhen Siwuwei Technology Co., Ltd.

Copyright Details


Application Details


Registration Number
VA0002174441
Registration Date
9/17/2019
Agency Marc Code
DLC-CO
Record Status
New
Corporate Author
Shenzhen Siwuwei Technology Co., Ltd
Physical Description
11 photographs Electronic file (eService)
First Publication Nation
United States

Notes


Rights Note: Junbo Chen, Shenzhen Siwuwei Technology Co., Ltd, 3G, Bldg A2, Zhujiang Square, No.9009 Longxiang Road, Longcheng Street, Longgang District, Shenzhen, Guangdong Province, Shenzhen, China, +86-755-8487-4010, aiwogep@outlook.com
Local Copyright Note: Regarding title information: Deposit contains complete list of titles that correspond to the individual photographs included in this groupRegarding group registration: A group of published photographs may be registered on one application with one filing fee only under limited circumstances. ALL of the following are required: 1. All photographs (a) were created by the same author AND (b) are owned by the same copyright claimant AND (c) were published in the same calendar year AND 2. The group contains 750 photographs or less AND 3. A sequentially numbered list of photographs containing the title, file name and month of publication for each photograph included in the group must be uploaded along with other required application materials. The list must be submitted in an approved document format such as .XLS or .PDF. The file name for the numbered list must contain the title of the group and the Case Number assigned to the application

Statements


Application Title Statement: Shenzhen Siwuwei Technology Co._AIWOGEP Mask
Author Statement: Shenzhen Siwuwei Technology Co., Ltd employer for hire Domicile: China Citizenship: China Authorship: photographs
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