2009

Study of silicon/silicon dioxide interface passivation and silicon dioxide reliability on deuterium implanted silicon

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Study of silicon/silicon dioxide interface passivation and silicon dioxide reliability on deuterium implanted silicon

Status

Published

on 12 Mar 2009

Year of Creation

2005

Tias Kundu

Registration Number

TX0006652950

on 12 Mar 2009

The U.S. Copyright record (Registration Number: TX0006652950) dated 12 Mar 2009, pertains to an electronic file (eService) titled "Study of silicon/silicon dioxide interface passivation and silicon dioxide reliability on deuterium implanted silicon" created in 2005. The copyright holder is Tias Kundu, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Tias Kundu.

Tias Kundu

Application Details

Registration Number

TX0006652950

Registration Date

3/12/2009

Year of Creation

2005

Agency Marc Code

DLC-CO

Record Status

New

Physical Description

Computer text data

Personal Authors

Tias Kundu

Notes

Rights Note: Rights and permissions info. on CORDS appl. in CO

Local Copyright Note: Electronic registration

Statements

Author Statement: entire text: Tias Kundu

Notes

Rights Note: Rights and permissions info. on CORDS appl. in CO

Local Copyright Note: Electronic registration

Statements

Author Statement: entire text: Tias Kundu

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